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Ceramic Chamber Deposition Equipment Components

Ceramic Chamber Deposition Equipment Components

- Ceramic chamber deposition equipment components The ceramic material is chosen based on the deposition chemistry to which will be exposed. For example, if plasma is used, a minimum 99.5% alumina must be used. The same consideration of gas chemistry is needed for determining the interior...

- Ceramic chamber deposition equipment components

The ceramic material is chosen based on the deposition chemistry to which will be exposed. For example, if plasma is used, a minimum 99.5% alumina must be used. The same consideration of gas chemistry is needed for determining the interior materials for plasma etch processes. If an anodised aluminium or alumina chamber is used with fluorinated gases or oxygen plasma then an yttria coating may be used on the anodised aluminium walls to prevent chemical attack. Yttria has superior erosion resistance and low particulation compared with alumina or thermal spray alumina coating.


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